Photooxidation of cyclohexanone in simulated atmosphere: A potential source of atmospheric formic acid

Publication date: May 2017
Source:Atmospheric Environment, Volume 157
Author(s): Aparajeo Chattopadhyay, Koushik Mondal, Monoj Samanta, Tapas Chakraborty
Gas phase photooxidation of cyclohexanone (CH) has been studied in the laboratory in a simulated atmospheric environment (synthetic air, 1 bar pressure) under the exposure of 311 nm UV light. Formic acid along with formaldehyde and ethylene are identified as the major photooxidation products. Quantum yield for the production of these species is measured and the values are compared with previous studies on the photo dissociation of CH. For 6 h of light irradiation with initial CH concentration of 9.19 ± 0.1 × 10¹⁶ molecules cm⁻³, the measured quantum yield values of ethylene and formaldehyde, the two primary photooxidation products, are 0.0395 ± 0.001 and 0.0028 ± 0.002, respectively. These values are comparable with CH dissociation quantum yield, 0.24 ± 0.02, and also the quantum yield of CO production, 0.0940 ± 0.001. The energetic parameters of different steps of the proposed reaction mechanism are calculated by electronic structure theory method at DFT/B3LYP/6–311++G** level. A reaction modeling has been performed, and similarity in simulated quantum yield values with that of the experimentally measured ones validates the suggested reaction mechanism. Experimentally measured values of rate constants of most of the elementary reaction steps incorporated in the modeling are not known, and the calculated values, obtained by use of CVT and RRKM theoretical methods are used. The total yield of formic acid, which has been assigned as a secondary oxidation product, is 3.46 ± 0.25 × 10¹⁵ molecules cm⁻³ as obtained from experiment and this data matches well with the value of 2.67 × 10¹⁵ molecules cm⁻³ obtained from reaction modeling for 6 h of UV irradiation. The yield of formic acid is comparable with the yield of primary photo products. The results imply that photooxidation of CH and analogous compounds might have significant contributions to production of formic acid in the earth's troposphere. According to the prediction of the modeling results presented here, the contribution of cyclohexanone photooxidation to the atmospheric concentration of formic acid is ∼1 pptv.

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